Silicon Devices and Process Integration

Name: Silicon Devices and Process Integration
Brand: Springer-Verlag New York Inc.
SKU: 9780387367989
Price: 725.1 PLN
Availability: InStock

Deep Submicron and Nano-Scale Technologies

Autor: Badih El- Kareh

Język:

Oprawa: Twarda

Wydawca: Springer-Verlag New York Inc.

Dostępność: Dostępna u dostawcy w małych ilościach

Wysyłamy za 11-15 dni

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Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristi...

Informacje o książce

Autor

Badih El- Kareh

Język

Angielski

Oprawa

Książka - Twarda

Data wydania

2009

strony

598

EAN

9780387367989

ISBN

0387367985

Enbook ID

01382042

Wydawca

Springer-Verlag New York Inc.

Waga

1040

Wymiary

155 x 235 x 45

Pełny opis

Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author s industrial and academic lecture notes and reflects years of experience in the development of silicon devices. §Features include:§§§A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon;§§§State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS;§§§CMOS-only applications, such as subthreshold current and parasitic latch-up;§§§Advanced Enabling processes and process integration.§§This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science.

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